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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Plasma states and carbon film deposition in glow discharge connected to dielectric barrier discharge
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Plasma states and carbon film deposition in glow discharge connected to dielectric barrier discharge

机译:闪光放电中的等离子体状态和碳膜沉积连接到介质屏障放电

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摘要

We developed a plasma source by connecting a direct current glow discharge (GD) with a dielectric barrier discharge (DBD) via a ground mesh (DB-GD). Based on the Langmuir probe measurements, the electron density of the DB-GD increased and the electron temperature decreased compared with those of the GD. Calculations of the electron energy distribution functions revealed that the DB-GD possessed a lower density of high-energy electrons and higher density of low-energy electrons than the GD did. We also confirmed that the DB-GD generated with methane gas was capable of producing an amorphous carbon film.
机译:通过通过地网(DB-GD)连接具有介电阻挡放电(DBD)的直流电流放电(GD)来开发等离子体源。 基于Langmuir探针测量,与GD的电气相比,DB-GD的电子密度增加,电子温度降低。 电子能量分布函数的计算表明,DB-GD具有比GD的高能量电子和更高的低能量电子密度更低的密度。 我们还证实,用甲烷气体产生的DB-GD能够产生非晶碳膜。

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