首页> 外国专利> DIELECTRIC BARRIER-TYPE PLASMA GENERATION DEVICE AND PLASMA DISCHARGE INITIATION METHOD FOR DIELECTRIC BARRIER-TYPE PLASMA GENERATION DEVICE

DIELECTRIC BARRIER-TYPE PLASMA GENERATION DEVICE AND PLASMA DISCHARGE INITIATION METHOD FOR DIELECTRIC BARRIER-TYPE PLASMA GENERATION DEVICE

机译:介质屏障型等离子体生成装置和介质屏障型等离子体生成装置等离子体放电启动方法

摘要

A dielectric barrier-type plasma generation device comprising: a dielectric substrate; a high voltage-side electrode which is provided to a first surface side of the dielectric substrate; a low voltage-side electrode which is provided to a second surface side of the dielectric substrate; and an electricity introduction part which is provided to one end of the high voltage-side electrode, wherein a gas flow passage is formed between the dielectric substrate and the low voltage-side electrode in order to allow gas to flow from one end side to the other end side thereof, a blow-out port for blowing out gas having flowed through the gas flow passage and plasma generated in the gas flow passage is formed at the other end side of the gas flow passage, and the dielectric substrate has a portion, the thickness of which becomes increasingly thinner toward the blow-out port.
机译:一种介质屏障型等离子体产生装置,包括:介电基板; 高压侧电极,其设置在介电基板的第一表面侧; 低电压侧电极,其设置在介电基板的第二表面侧; 和电介质部分设置在高压侧电极的一端,其中气体流动通道形成在介电基板和低电压侧电极之间,以便允许气体从一个端侧流动到 其其他端侧,用于吹出流过气体流动通道的气体的吹出端口和在气流通道中产生的等离子体形成在气体流动通道的另一端侧,并且电介质基板具有一部分, 厚度朝向吹出端口变得越来越薄。

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