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机译:氮离子辐射参数对脉冲真空弧沉积法制备含氮碳涂层性能的影响
Belgorod Natl Res Univ Fed State Autonomous Educ Inst Higher Educ 85 Pobeda Str Belgorod 308015 Russia;
Belgorod Natl Res Univ Fed State Autonomous Educ Inst Higher Educ 85 Pobeda Str Belgorod 308015 Russia;
CINVESTAV Dept Ingn Elect SEES Mexico City DF Mexico;
CINVESTAV Dept Ingn Elect SEES Mexico City DF Mexico;
Belgorod Natl Res Univ Fed State Autonomous Educ Inst Higher Educ 85 Pobeda Str Belgorod 308015 Russia;
Belgorod Natl Res Univ Fed State Autonomous Educ Inst Higher Educ 85 Pobeda Str Belgorod 308015 Russia;
Belgorod Natl Res Univ Fed State Autonomous Educ Inst Higher Educ 85 Pobeda Str Belgorod 308015 Russia;
Belgorod Natl Res Univ Fed State Autonomous Educ Inst Higher Educ 85 Pobeda Str Belgorod 308015 Russia;
Ta-C; Vacuum arc deposition; Nitrogenated ta-C; Ion irradiation;
机译:氮离子辐射参数对脉冲真空弧沉积法制备含氮碳涂层性能的影响
机译:通过脉冲偏压阴极真空电弧沉积制备的类金刚石碳涂层的表征
机译:低能量高电流脉冲电子束照射涂层真空电弧等离子体辅助沉积硅表面的结构与性能
机译:沉积在真空氮化物涂层的结构和性能下高压脉冲电位的影响
机译:脉冲激光沉积制备的氮化物超晶格硬质涂层的结构性能关系
机译:在真空和环境氩气中通过脉冲激光沉积制备的TiNi薄膜的组成和晶体性质
机译:基于碳和氮掺杂碳的涂层的性质使用脉冲真空弧法得到