Method of operating pulsed arc deposition source and vacuum processing apparatus having pulsed arc deposition source

摘要

Operating an arc source by generating an electric spark discharge on the surface of a target, where the spark discharge is supplied simultaneously with direct current and pulsed or alternating current, comprises covering the surface of the target with an insulating layer. Independent claims are also included for: (1) operating an arc source by generating an electric spark discharge on the surface of a target, where the spark discharge is supplied simultaneously with direct current and pulsed or alternating current and the direct current component is 100-300% of the holding current; (2) operating an arc source by generating an electric spark discharge on the surface of a target, where the spark discharge is supplied simultaneously with direct current and pulsed or alternating current and the direct current component is 30-90 A; (3) coating process in which an arc source as above is driven to deposit one or more layers on a workpiece; (4) etching process in which an arc source as above is driven to etch a workpiece with metal ions while applying a direct, pulsed or alternating current bias; (5) arc source with a target and at least one counterelectrode and a current supply unit connected to the target, where the current supply unit comprises a pulsed high-amperage current supply and another current supply; (6) arc source with a target and at least one counterelectrode and a current supply unit connected to the target, where the current supply unit comprises a secondary current supply whose signal is modulated so as to apply a DC holding current on which is superimposed a pulsed or AC signal; (7) arc source with a target and at least one counterelectrode and a current supply unit connected to the target, where the current supply unit comprises a primary current supply whose signal is modulated so as to apply a DC holding current on which is superimposed a pulsed or AC signal.