Method for operating a vaporization source and pulsed arc processing facility vacuum vaporization source with pulsed arc

摘要

Processing facility vacuum chamber (1) vacuum treatment of the surface parts (3) with a source (5) vaporization arc, comprising an anode (6) and a first electrode (5 ') configured comoelectrodo of target, the anode (6) and this electrode (5 ') with a source (13) continuously concorriente supply and a second electrode (3, 18, 20, 22) arranged spaced from the source being connected (5 ) of Conarco vaporization chamber (1) vacuum, wherein the two electrodes (5 ', 3, 18, 20, 22) are connected with unafuente (16) bipolar pulsed current for forming a discharge path additional.