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首页> 外文期刊>Tribology Transactions >pH Dependence of Tribochemical Wear of Silicon Nitride Sliding against Polycrystalline Diamond in Alkaline Solutions
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pH Dependence of Tribochemical Wear of Silicon Nitride Sliding against Polycrystalline Diamond in Alkaline Solutions

机译:碱性溶液中氮化硅氮化硅跨越氮化硅磨损的pH依赖性

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摘要

The tribological behaviors of silicon nitride sliding upon sintered polycrystalline diamond (PCD) were explored via altering pH levels. High reductions in the friction and wear are achieved when sodium hydroxide solution is introduced at the contact interfaces. This reduction is found to depend on the pH value of the alkaline solution. The friction coefficient and wear loss of silicon nitride vary with pH level by more than half an order of magnitude and achieves the lowest values at pH 13. Moreover, the tribological behaviors reveal three stages versus the pH level, for which different tribochemical reactions occur due to the dissimilar hydroxyl concentrations. The dissolution of reaction products, such as Si(OH)(4) and dimers (OH)(3)Si-O-C(OH)(3), might lead to an increased proportion of hydrodynamic lubrication in the mixed lubrication regime and hence yield reduced friction and wear.
机译:通过改变pH水平探索烧结多晶金刚石(PCD)时氮化硅滑动的摩擦族行为。 当在接触界面引入氢氧化钠溶液时,实现了摩擦和磨损的高减少。 发现这种还原取决于碱性溶液的pH值。 氮化硅的摩擦系数和磨损损失随着pH水平的量而变化超过一半的数量级,并在pH13的最低值实现。此外,摩擦学行为揭示了三个阶段与pH水平相比,不同的培养学反应发生 对不同的羟基浓度。 反应产物的溶解,例如Si(OH)(4)和二聚体(OH)(3)Si-OC(OH)(3),可能导致混合润滑制度中的流体动力学润滑比例增加,因此产量增加 减少摩擦和磨损。

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