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Electronic Structure of Aluminum Oxide with Oxygen Vacancies

机译:氧化铝氧化铝的电子结构

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Results of numerical calculations of the electronic structure of nonstoichiometric aluminum oxide with a concentration of oxygen vacancies of 6% have been presented. The calculations have been performed within the scope of the density-functional theory of the coherent-potential approximation with a disordered location of vacancies. It has been established that the presence of oxygen vacancies leads to the appearance of a peak in the density of states inside the energy gap and additional electronic states at the bottom of the conduction band, which gives a decrease in the energy gap to 2 eV. The simulation of the aluminum oxide of composition Al-2[O-0.98](3)O-0.06(interstitial) with vacancies in the oxygen sublattice and oxygen atoms in interstices leads to a semiconducting character of the energy spectrum with a band gap of similar to 1 eV, which is formed between the p states of the impurity interstitial oxygen atoms and the s states of the vacancies.
机译:已经介绍了具有6%氧空穴浓度为6%的非分层氧化铝电子结构的数值计算结果。 已经在密度 - 函数理论的范围内进行了相干电位近似的范围,与空缺的失序位置。 已经确定,氧空位的存在导致能量隙中的状态密度的峰值的外观和导电带底部的附加电子状态,这使得能量隙减小到2eV。 在间隙中氧气子组合物和氧原子中的空位的组合物Al-2 [O-0.98](3)O-0.06(间质)的氧化铝的模拟导致能量谱的半导体特征 类似于1eV,其在杂质间质氧原子的P状态和空位的状态之间形成。

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