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首页> 外文期刊>Physica, E. Low-dimensional systems & nanostructures >Insights on Si doping on PNRs for NDR with high PVR and diode behaviour with a high rectification ratio
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Insights on Si doping on PNRs for NDR with high PVR and diode behaviour with a high rectification ratio

机译:具有高精度率高的PVR和二极管行为对NDRS的SI掺杂的见解

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This work uncovers the physics and application of APNRs by doping Silicon and Sulfur as P-type and N-type dopants. Structurally optimized 8APNRs chains were used throughout the work where the electrical properties were calculated using DFT technique. It was found that heavy doping by either P-type or N-type atoms in 8APNRs device produces NDR behaviour but only p-doped APNRs provides higher Peak to Valley Ratio (PVR). Consequently, if both the impurities were doped in an equal proportion to form a PN junction in 8APNRs, NDR occurrence was suppressed by the added opponent dopants and turned to possess rectifying behaviour. Electrical transport characteristics of 8APNRs based PN Junction diode was analyzed using NEGF formalism where a very high rectification ratio (RR) of the order of 10(12 )was observed which was much higher than what achieved in N doped AGNRs device (RR similar to 10(2)). This observation benchmarks the utilization of PNRs diodes as an ideal rectifier over GNRs.
机译:通过掺杂硅和硫作为p型和n型掺杂剂,本作物理和应用APNR。 在整个工作中使用结构优化的8APNRS链条,其中使用DFT技术计算了电性能。 发现通过8APNRS器件中的p型或n型原子的重掺杂产生NDR行为,但只有P掺杂APNR为谷比(PVR)提供更高的峰值。 因此,如果在8APNRS中以相等的比例掺杂两种杂质以形成PN结,则由添加的对手掺杂剂抑制NDR发生并转向具有整流行为。 基于8APNRS的PN结二极管的电气传输特性使用NegF形式主义分析,其中观察到10(12)级的非常高的整流比(RR),其远高于N掺杂AGNRS装置(RR类似于10的RR (2))。 该观察结果基准将PNR二极管的利用率作为GNRS的理想整流器。

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