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Integrated semiconductor with diode-resistor configuration - has pinch resistor with pinch doped region greater than cross=section of residual resistor doped region

机译:具有二极管电阻器配置的集成半导体-收缩电阻器的收缩掺杂区大于横截面=残余电阻器掺杂区的横截面

摘要

The highly integrated semiconductor device is intended as a separating diode cooperating with selector lines of an integrated memory. The resistor (R) is of pinch-type whose pinch doping region (5) is greater than the cross sectional dimension of the resistor doping region (4). Simultaneously it forms a cathode connection doping region for the Schottky diode (D). Preferably the pinched doping region carries a connection contact (K) for the Schottky diode cathode terminal. This doped region is of identical conductivity as the surrounding semiconductor material (3), but of higher doping rate, sufficient to form an ohmic contact with a metal electrode on the region. On the resistance region (4) outside the pinch doping region is provided a metal contact (A), extending beyond the resistance region. -
机译:高度集成的半导体器件旨在用作与集成存储器的选择器线配合的分离二极管。电阻器(R)是收缩型的,其收缩掺杂区(5)大于电阻掺杂区(4)的横截面尺寸。同时,它形成了肖特基二极管(D)的阴极连接掺杂区。优选地,收缩的掺杂区域带有用于肖特基二极管阴极端子的连接触点(K)。该掺杂区具有与周围的半导体材料(3)相同的导电率,但是具有更高的掺杂速率,足以与该区域上的金属电极形成欧姆接触。在夹点掺杂区域外部的电阻区域(4)上提供了延伸到电阻区域之外的金属触点(A)。 --

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