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机译:InGaN生长中断对基于InGaN的多量子阱结构的光致发光性能的影响
Shandong Univ Sch Microelect Jinan 250100 Peoples R China;
Shandong Univ Sch Microelect Jinan 250100 Peoples R China;
Shandong Inspur Huaguang Optoelect Co Ltd Weifang 261061 Peoples R China;
Shandong Inspur Huaguang Optoelect Co Ltd Weifang 261061 Peoples R China;
Shandong Univ Sch Microelect Jinan 250100 Peoples R China;
Shandong Univ Sch Microelect Jinan 250100 Peoples R China;
Shandong Univ Sch Microelect Jinan 250100 Peoples R China;
Shandong Univ State Key Lab Crystal Mat Jinan 250100 Peoples R China;
InGaN/GaN; Photoluminescence (PL); Carrier localization effect; Quantum-confined Stark effect (QCSE); Growth interruption;
机译:InGaN生长中断对基于InGaN的多量子阱结构的光致发光性能的影响
机译:生长中断过程中用三甲基铟处理的InGaN / GaN多量子阱的光学性质
机译:MBE和MOCVD生长的Ingan / GAN多量子阱结构的光致发光性质比较
机译:使用不同的生长参数,通过MOCVD生长的InGaN / GaN多量子阱结构的表面形态和光学性质
机译:InGaN / GaN多量子阱结构:亚微米结构,光学,电和化学性质。
机译:非对称量子阱对InGaN基发光二极管结构和光学性能的影响
机译:生长中断对In-In-InGaN / GaN单量子阱结构光学性能的影响