...
首页> 外文期刊>Surface review and letters >MICROSTRUCTURE AND BLUE PHOTOLUMINESCENCE OF HYDROGENATED SILICON CARBONITRIDE THIN FILMS
【24h】

MICROSTRUCTURE AND BLUE PHOTOLUMINESCENCE OF HYDROGENATED SILICON CARBONITRIDE THIN FILMS

机译:氢化碳氮化硅薄膜的微观结构和蓝色光致发光

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Hydrogenated silicon carbonitride (SiCN:H) thin films were deposited by sputtering of silicon carbide target in hydrogen-doped argon and nitrogen atmospheres. The properties of the SiCN:H films were analyzed by scanning electron microscopy with energy dispersive spectrometer, atomic force microscope, Fourier transform infrared spectroscopy, X-ray diffraction and fluorescence spectrophotometer. No distinct crystal was formed in the SiCN:H films as-deposited and annealed at 600 degrees C and 800 degrees C. The SiCN:H films were mainly composed of Si-N, Si-C, Si-O, C-C, C-N,C N,N-H-n bonds and SiCxNy network structure. The strong blue photoluminescence observed from the SiCN:H film annealed at 600 degrees C was attributed to SiCxNy network structure.
机译:通过在氢掺杂氩气和氮气静脉内溅射碳化硅靶标溅射氢化碳氮化硅(SiCN:H)薄膜。 通过用能量色散光谱仪,原子力显微镜,傅立叶变换红外光谱,X射线衍射和荧光分光光度计进行扫描电子显微镜,分析SiCN:H膜的性质。 在SiCN:H薄膜中形成没有明显的晶体,在600℃和800℃下沉积和退火。SiCN:H膜主要由Si-N,Si-C,Si-O,CC,CN组成, CN,NHN键和SICXNY网络结构。 从SICN:H薄膜观察到的强烈蓝色光致发光,在600摄氏度下退火归因于SICXNY网络结构。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号