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机译:反应磁控溅射沉积氢化碳氮化硅薄膜的组成和光学性能可调性
Univ Clermont Auvergne, CNRS, SIGMA Clermont, ICCF, F-63000 Clermont Ferrand, France;
Univ Clermont Auvergne, CNRS, SIGMA Clermont, ICCF, F-63000 Clermont Ferrand, France;
Univ Clermont Auvergne, CNRS, Inst Pascal, F-63000 Clermont Ferrand, France;
Univ Clermont Auvergne, CNRS, Inst Pascal, F-63000 Clermont Ferrand, France;
Univ Clermont Auvergne, CNRS, Inst Pascal, F-63000 Clermont Ferrand, France;
CNRS, PROMES, Tecnosud, Rambla Thermodynam, F-66100 Perpignan, France;
Univ Lorraine, Inst Jean Lamour, UMR 7198, Fac Sci & Technol, F-54506 Vandoeuvre Les Nancy, France;
Univ Nantes, UMR CNRS 6502, Inst Mat Jean Rouxel IMN, F-44322 Nantes, France;
CEMHTI Condit Extremes & Mat Haute Temp & Irradia, F-45100 Orleans, France;
Univ Clermont Auvergne, CNRS, SIGMA Clermont, ICCF, F-63000 Clermont Ferrand, France;
Silicon carbonitride thin films; Reactive magnetron sputtering; Structure; Optical properties;
机译:通过反应性高功率脉冲磁控溅射沉积的碳碳氮化硅薄膜
机译:Ar / O
机译:SiC靶通过反应性Rf磁控溅射沉积的碳氧化硅薄膜的结构和光学性质
机译:活性直流磁控溅射沉积碳氮化硅薄膜的结构和光学性能
机译:射频反应磁控溅射在低温下沉积在硅上的压电氮化铝薄膜的声波器件特性
机译:射频磁控溅射沉积ZnS薄膜的结构和光学性质
机译:沉积纳米复合碳氮化硅薄膜的拉曼研究 通过RF磁控管溅射在不同的衬底温度下