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METHOD FOR PRODUCTION OF RE-EMITTING TEXTURED THIN FILMS BASED ON AMORPHOUS HYDROGENATED SILICON WITH SILICON NANOCRYSTALS

机译:基于非晶态加氢硅和硅纳米晶的减薄纹理薄膜的制备方法

摘要

FIELD: physics, instrumentation.;SUBSTANCE: invention refers to optoelectronic technology and can be used to create textured re-emitting coatings for application in thin film solar cells. The method for production of re-emitting textured thin films based on hydrogenated amorphous silicon with silicon nanocrystals comprises preparation of thin films of hydrogenated amorphous silicon, which are treated in the air atmosphere by femtosecond laser pulses with a central emission wavelength of 500-1100 nm, pulse repetition frequency of 50-500 kHz, pulse duration of 100-500-fs and laser pulse energy density of 260-500 mJ/cm2.;EFFECT: invention allows formation of re-emitting textured thin films, effectively absorbing the ultraviolet portion of solar spectrum with its subsequent conversion into visible light.;5 cl, 5 dwg
机译:领域:物理,仪器;物质:发明是指光电技术,可以用于制造用于薄膜太阳能电池的纹理化再发光涂层。用于基于氢化非晶硅和硅纳米晶体的再发射纹理化薄膜的生产方法包括制备氢化非晶硅薄膜,该薄膜在空气中通过飞秒激光脉冲进行处理,中心发射波长为500-1100 nm ,脉冲重复频率为50-500 kHz,脉冲持续时间为100-500-fs,激光脉冲能量密度为260-500 mJ / cm 2 。;效果:本发明允许形成重新发射的纹理薄膜,有效吸收太阳光谱的紫外线部分,然后将其转换为可见光。; 5 cl,5 dwg

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