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Development of sputtered Nb3Sn films on copper substrates for superconducting radiofrequency applications

机译:超导射频应用溅射基板上溅射NB3SN薄膜的研制

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Superconducting radiofrequency (SRF) cavities that could provide a higher quality factor as well as a higher operational accelerating gradient at an affordable cost are in high demand for the future generation of particle accelerators. This study aims to demonstrate the potential of Nb3Sn as material of choice for such SRF applications. Due to its brittle nature, the only way to produce an Nb3Sn SFR cavity is to synthesise a thin layer inside a cavity made of niobium or copper. In this work, direct current magnetron sputtering using a stoichiometric target of Nb3Sn was employed to produce films on copper samples. Assessment of the morphology, microstructure and superconducting properties were performed in order to ensure that this approach is suitable for SRF applications. The potential of the method is proven by obtaining films, which exhibit a crack-free surface, dense morphology and critical temperatures (T-c) up to 16 K. The essential properties of the films have also been investigated with respect to the deposition and annealing conditions. The use of krypton as working gas during deposition increases the atomic percent of Sn in the film compared to argon. However, in contrast to argon, higher krypton pressures reduce the atomic percent of Sn. It was also found that long-lasting high-temperature annealing leads to higher superconducting critical temperatures due to an increased crystallographic order. Particular attention was given to the influence of the copper substrate on the film growth as well as the microstructural and superconducting characteristics. We discuss the main constraints introduced by the copper substrate, such as copper interdiffusion during annealing, lattice mismatch and difference in thermal expansion coefficients and methods to overcome them.
机译:超导射频(SRF)空腔可以提供更高质量因子以及以实惠的成本提供更高的操作加速梯度,对未来产生粒子加速器的需求很高。本研究旨在证明NB3SN作为这种SRF应用的首选材料的潜力。由于其脆性性质,产生Nb3sn Sfr腔的唯一方法是在铌或铜制成的腔内合成薄层。在这项工作中,使用使用Nb3Sn的化学计量靶的直流磁控溅射在铜样品上产生薄膜。进行了形态,微观结构和超导特性的评估,以确保该方法适用于SRF应用。通过获得薄膜的薄膜来证明该方法的电位,其表现出无裂缝表面,致密的形貌和临界温度(Tc),高达16k。还研究了薄膜的基本性质,并研究了沉积和退火条件。在沉积期间使用Krypton作为工作气体增加与氩气相比膜中Sn的原子百分比。然而,与氩气形成鲜明对比,较高的氪压力降低了Sn的原子百分比。还发现,由于晶莹级顺序增加,长持久的高温退火导致超导临界温度更高。特别注意铜基材对薄膜生长以及微观结构和超导特性的影响。我们讨论铜基材引入的主要约束,例如退火期间的铜相互作用,晶格错配和热膨胀系数的差异和克服它们的方法。

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