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首页> 外文期刊>Solid state sciences >Chemical, electrical and carrier transport properties of Au/cytosine/undoped-InP MPS junction with a cytosine polymer
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Chemical, electrical and carrier transport properties of Au/cytosine/undoped-InP MPS junction with a cytosine polymer

机译:Au /胞嘧啶/未掺杂INP MPS结用胞嘧啶聚合物的化学,电气和载体传输性能

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摘要

An Au/cytosine/undoped-InP metal/polymer/semiconductor (MPS) junction was prepared with a cytosine polymer layer by spin coating and e-beam processes. The chemical properties were explored with X-ray photoelectron spectroscopy (XPS) approach and the results confirmed that the cytosine thin film was grown on undoped-InP surface. The electrical properties of MPS were compared with the Au/undoped-InP Schottky junction (SJ) results. Higher barrier height (BH) was achieved for the MPS junction (0.63 eV) than the SJ (0.57 eV), which demonstrates the BH was influenced by the cytosine interlayer. The BH, ideality factor and series resistance of SJ and MPS junction were derived by Chenug's, Norde functions and S-V plot. The derived BH by these three approaches were almost equal with one another that suggests their steadiness and validity. The Poole-Frenkel emission governed the reverse current conduction mechanism in the lower bias region, whereas Schottky emission was ruled in the higher bias region for both the SJ and MPS junction. Analysis demonstrates that such cytosine polymer layers have prospective for use in organic and inorganic electronic devices.
机译:通过旋涂和电子束工艺用胞嘧啶聚合物层制备Au /胞嘧啶/未掺杂的InP金属/聚合物/半导体(MPS)结。用X射线光电子能谱(XPS)方法探索化学性质,结果证实了胞嘧啶薄膜在未掺杂的INP表面上生长。将MP的电性能与AU / UNDOWED-INP肖特基结(SJ)结果进行比较。对于MPS结(0.63eV)实现较高的阻挡高度(BH),比SJ(0.57eV)(0.57eV),其证明BH受胞嘧啶中间层的影响。 Chenug,Norde功能和S-V Plot来源的BH,理想因素和SJ和MPS结的串联电阻。这三种方法的衍生的BH几乎与彼此的唯一和有效性相等。 Poole-Frenkel排放控制了下偏置区域的反向电流导通机制,而肖特基排放在较高偏置区域中统治,用于SJ和MPS结。分析表明,这种胞嘧啶聚合物层具有用于有机和无机电子器件的前景。

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