机译:基于富含硅碳化硅薄膜的孔选择性后触点的退火温度和掺杂的相互作用
EPFL Inst Microengn IMT Photovolta &
Thin Film Elect Lab PV Lab CH-2000 Neuchatel Switzerland;
EPFL Inst Microengn IMT Photovolta &
Thin Film Elect Lab PV Lab CH-2000 Neuchatel Switzerland;
EPFL Inst Microengn IMT Photovolta &
Thin Film Elect Lab PV Lab CH-2000 Neuchatel Switzerland;
EPFL Inst Microengn IMT Photovolta &
Thin Film Elect Lab PV Lab CH-2000 Neuchatel Switzerland;
CSEM PV Ctr CH-2000 Neuchatel Switzerland;
Natl Inst Adv Ind Sci &
Technol Res Ctr Photovolta 1-1-1 Umezono Tsukuba Ibaraki 3058568 Japan;
EPFL Inst Microengn IMT Photovolta &
Thin Film Elect Lab PV Lab CH-2000 Neuchatel Switzerland;
CSEM PV Ctr CH-2000 Neuchatel Switzerland;
EPFL Inst Microengn IMT Photovolta &
Thin Film Elect Lab PV Lab CH-2000 Neuchatel Switzerland;
EPFL Inst Microengn IMT Photovolta &
Thin Film Elect Lab PV Lab CH-2000 Neuchatel Switzerland;
EPFL Inst Microengn IMT Photovolta &
Thin Film Elect Lab PV Lab CH-2000 Neuchatel Switzerland;
Passivating contact; Silicon solar cells; Chemical oxide; Boron diffusion; Contact resistivity; Hydrogenation; SiCx; Silicon heterojunction;
机译:基于富含硅碳化硅薄膜的孔选择性后触点的退火温度和掺杂的相互作用
机译:用于基于晶体硅的太阳能电池的富含硅的碳化硅孔选择后触点
机译:基于掺杂硅膜的物理气相沉积,具有空穴选择性钝化接触的效率为23%的p型晶体硅太阳能电池
机译:低温退火的掺do富硅氧化膜中的能量敏化
机译:快速,选择性和稳定的高温湿度传感器可通过微制造掺杂钇的锆酸钡薄膜实现。
机译:暴露于丙烷下在不同温度下工作的M掺杂CuO基薄膜的气体传感性能
机译:富含硅的碳化硅孔 - 基于晶体硅的太阳能电池的碳化硅孔选择性后触点
机译:室温薄膜Ba(x)sr(1-x)TiO3 Ku波段耦合微带相移器:膜厚度,掺杂,退火和基板选择的影响