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Chemical catalysts of Fenton reaction for single-crystal SiC based on nanoindentation

机译:基于纳米狭窄的单晶SiC的芬顿反应的化学催化剂

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Aiming at production of single-crystal SiC for chemical mechanical polishing, Fenton reaction, and catalytic efficiency of FeSO_(4), Fe_(2)(SO_(4))_(3), FeO, Fe_(3)O_(4), and Fe_(2)O_(3) were studied. The mechanical properties are obtained by nanoindentation experiments. Different catalysts can promote Fenton reaction, and all reaction layers formed with the same chemical composition, atomic structure, and hardness at 1.5 GPa. When Fe_(3)O_(4) was used as catalyst in Fenton reaction, the effect was optimal because its hardness and modulus remained low. After 2 min, the thickness of reaction layer had reached 200 nm, which can fully meet requirements of CMP. Fenton reaction depends on ability of catalyst to ionise Fe~(2+). The higher concentration of Fe~(2+), the higher concentration of OH, and the faster reaction rate of SiC surface material.
机译:旨在生产单晶SiC进行化学机械抛光,芬顿反应和Feso_(4),Fe_(2)的催化效率,Fe_(2)(SO_(4))_(3),FEO,FE_(3)O_(4) 和FE_(2)O_(3)进行了研究。 通过纳米凸缘实验获得机械性能。 不同的催化剂可以促进芬顿反应,并且所有用相同的化学成分,原子结构和1.5GPa的硬度形成的反应层。 当FE_(3)O_(4)用作FENTON反应中的催化剂时,效果是最佳的,因为其硬度和模量仍然很低。 2分钟后,反应层的厚度达到200nm,可以完全满足CMP的要求。 芬顿反应取决于催化剂对电离Fe〜(2+)的能力。 较高浓度的Fe〜(2+),浓度较高,OH浓度较高,以及SiC表面材料的更快的反应速率。

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