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BIXS for tritium analysis with Ar gas and Al thin film as beta-ray stopping layers and comparison with EBS

机译:与Ar Gas和Al薄膜作为β射线停止层的氚分析BIX,与EBS比较

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摘要

beta-ray induced X-ray spectrometry (BIXS) and elastic backscattering spectrometry (EBS) were utilized in this study for the tritium analysis of samples of tritium/deuterium-containing titanium films with thick Mo substrates. Using the BIXS method which incorporates Monte Carlo simulated data, we used Ar gas filler (BIXS-Ar) or placed Al film (BIXS-Al), respectively, between the sample and X-ray detector as beta-ray stopping layers. Using the EBS method to confirm whether or not the tritium will volatilize under the impact of the proton beams, we conducted two measurements at the same point of the sample surfaces. A TiH film sample with thick Mo substrate was used in our EBS experiment to remove the influence of the Mo spectrum on the EBS experimental spectra of tritium/deuterium-containing samples. We well fit using the SIMNRA code the tritium and deuterium EBS spectra that were obtained by removing the Mo spectra. The tritium content and depth profiles in the titanium films were obtained via these different methods and the results were compared. It was found that the total tritium content measured using the EBS, BIXS-Al, and BIXS-Ar methods were in agreement within the experimental uncertainties, and the BIXS-Al method may be better at measuring the tritium depth profiles than the BIXS-Ar method.
机译:在本研究中使用了β射线诱导的X射线光谱(BIX)和弹性反向散射光谱(EBS),用于厚的MO衬底的氚/氘钛膜样品的氚分析。使用包含蒙特卡罗模拟数据的Bixs方法,我们将Ar气体填料(Bixs-Ar)或放置的Al膜(Bixs-Al)置于样品和X射线检测器之间作为β射线停止层。使用EBS方法确认氚是否会在质子梁的影响下挥发,我们在样品表面的同一点进行两次测量。在我们的EBS实验中使用具有厚MO衬底的TiH膜样品,以除去Mo光谱对含氚/氘样品的EBS实验光谱的影响。我们非常适合通过去除Mo光谱而获得的氚和氘EBS光谱。通过这些不同的方法获得钛膜中的氚含量和深度曲线,并比较结果。发现使用EBS,BIXS-A1和BIXS-AR方法测量的总氚含量在实验的不确定性中一致,并且BIXS-Al方法可以更好地测量比BIXS-AR的氚深度剖面更好方法。

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