Fabrication of Vertical Organic Nanowire Arrays via Modified Nanoimprint Lithography

摘要

In this study, polymer high-aspect-ratio vertical organic nanowire arrays with sub-100 nm resolution were fabricated using a new method based on modified nanoimprint lithography, including UV-imprinting process and chemical corrosion solution. Porous anodic alumina membranes are the imprint templates having pore diameters of about 300 nm and 70 nm-90 nm. We performed the fabrication of the polymer nanowire array structures. Replication performance for the UV-curable imprint resister was verified by nanoimprinting technique to replicate the porous anodic alumina templates. Releasing the templates using chemical corrosion of alkali solution, we achieved the polymer nanowire arrays with nanowire diameters of 300 nm and 70 nm-90 nm and depths of 30 mu m and 3 mu m, and the aspect ratio of about 100:1 and 40:1. We herein also discuss the physical performance of the polymer resist and optical performance for high-aspect-ratio structures. The polymer nanowire arrays have potential applications such as electronic and optical devices and new method in complicated and extreme structures.