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Effect of thickness and annealing temperature on the structural properties of CuO thin films prepared by sol-gel spin coating technique

机译:厚度和退火温度对溶胶 - 凝胶旋转涂层技术制备CuO薄膜结构性能的影响

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In this work, CuO thin films were deposited by sol gel spin-coating technique on microscope glass substrates. Copper acetate was used as the starting salt material source, ethanol as solvent and monoethanolamine as stabiliser. The as-coated films were preheated at 300 degrees C for 10 min and then annealed using two different temperatures. As the annealing temperature was increased from 500 degrees C to 600 degrees C, along with thickness, an improvement of the structural properties was concluded from XRD and SEM analyses. I-V characteristics of the films corroborated this result and showed existence of a normal Ohmic behaviour of these films. The average crystallite size estimated from XRD analysis was found to increase from 28.06 to 37.68 nm with the increase of both thickness and annealing temperature. On the other hand, the two parameters dislocation density and strain followed an opposite trend and decreased from 1.27 to 0.704 (10(15) lines/m(2)) and from 1.29 x 10(-3) to 0.961 x 10(-3), respectively.
机译:在这项工作中,通过溶胶凝胶纺丝涂层技术在显微镜玻璃基板上沉积CuO薄膜。乙酸铜用作起始盐材料源,乙醇作为溶剂和单乙醇胺作为稳定剂。将涂覆的薄膜在300℃下预热10分钟,然后使用两个不同的温度退火。随着退火温度从500℃升高至600℃,随着厚度的速度,从XRD和SEM分析中得出了结构性的改善。电影的I-V特性证实了该结果,并显示出这些薄膜的正常欧姆行为的存在。发现从XRD分析估计的平均微晶尺寸从厚度和退火温度的增加增加到0.06至37.68nm。另一方面,两个参数位错密度和菌株随后是相反的趋势,从1.27到0.704(10(15)条/ m(2))和1.29×10(-3)至0.961×10(-3 ), 分别。

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