...
首页> 外文期刊>Mutation research-Fundamental and Molecular Mechanisms of Mutagenesis >Electrochemical investigation of uranyl species reduction in alkaline oxalate electrolyte and microstructural characterization of deposited nanocrystalline UO2 thin films
【24h】

Electrochemical investigation of uranyl species reduction in alkaline oxalate electrolyte and microstructural characterization of deposited nanocrystalline UO2 thin films

机译:铀酰胺铀酸盐电解质降低的电化学研究及沉积纳米晶UO2薄膜的微观结构特征

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

In this study, electrochemical reduction behaviour of uranyl ions was investigated from an alkaline oxalate complex electrolyte. Detailed results of scan rates, pH and temperature dependent cyclic voltammetry were analysed to extract diffusion coefficients and to elucidate reduction mechanism. A two-step mechanism was established where the first step involving reduction of UO22+ to UO2+ was a slower and reversible in nature and the second step was proton assisted reduction of UO2+ to UO2. Detailed speciation study of the electrolyte confirmed [UO2(C2O4)(3)](4-) as the predominant species in the pH range 5.0 to 8.5. XPS analyses of as-deposited oxide film confirmed about the formation of UO2 with a small percentage of UO3. For annealed films (at 973 K for 1 h), majority of oxide film was present in mixed valence state containing U6+ and U5+ with a small amount of U4+. High resolution transmission electron microscope (HR-TEM) examination of as-deposited film revealed the deposition of an ultra-nanocrystalline UO2 film with average gain size of 3.0 nm. However, annealed sample showed substantial grain growth associated with reduced inter-grain amorphous region. The average grain size obtained was 9.8 nm with lattice fringe spacing was 0.32 nm corresponding to the fcc UO2.
机译:在该研究中,从碱性草酸盐复合电解质中研究了铀酰离子的电化学还原行为。分析了扫描速率,pH和温度依赖性环伏响铃的详细结果以提取扩散系数并阐明还原机制。建立了一种两步机制,其中涉及将UO22 +降低到UO2 +的第一步是自然较慢并且可逆的,第二步是质子辅助UO2 +至UO2的减少。作为pH范围5.0至8.5的主要物种,电解质的详细物质研究证实[UO2(C2O4)(3)](4-)。 XPS分析的沉积氧化膜的含有少量UO3的UO 2形成。对于退火薄膜(在973K持续1小时)中,大部分氧化物膜以含有U6 +和U5 +的混合价状态存在,少量U4 +。沉积膜的高分辨率透射电子显微镜(HR-TEM)检查显示超纳米晶UO2膜的沉积,平均增益尺寸为3.0nm。然而,退火样品显示出与谷粒间无定形区域的降低相关的大量晶粒生长。获得的平均晶粒尺寸为9.8nm,晶格条纹间隔为0.32nm,对应于FCC UO 2。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号