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Pore Polarity and Charge Determine Differential Block of Kir1.1 and Kir7.1 Potassium Channels by Small-Molecule Inhibitor VU590

机译:小分子抑制剂Vu590,孔极性和电荷确定Kir1.1和Kir7.1钾通道的差分块

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摘要

VU590 was the first publicly disclosed, submicromolar-affinity (IC50 = 0.2 mu M), small-molecule inhibitor of the inward rectifier potassium (Kir) channel and diuretic target, Kir1.1. VU590 also inhibits Kir7.1 (IC50 similar to 8 mu M), and has been used to reveal new roles for Kir7.1 in regulation of myometrial contractility and melanocortin signaling. Here, we employed molecular modeling, mutagenesis, and patch clamp electrophysiology to elucidate the molecular mechanisms underlying VU590 inhibition of Kir1.1 and Kir7.1. Block of both channels is voltage-and K+-dependent, suggesting the VU590 binding site is located within the pore. Mutagenesis analysis in Kir1.1 revealed that asparagine 171 (N171) is the only pore-lining residue required for high-affinity block, and that substituting negatively charged residues (N171D, N171E) at this position dramatically weakens block. In contrast, substituting a negatively charged residue at the equivalent position in Kir7.1 enhances block by VU590, suggesting the VU590 binding mode is different. Interestingly, mutations of threonine 153 (T153) in Kir7.1 that reduce constrained polarity at this site (T153C, T153V, T153S) make wild-type and binding-site mutants (E149Q, A150S) more sensitive to block by VU590. The Kir7.1-T153C mutation enhances block by the structurally unrelated inhibitor VU714 but not by a higher-affinity analog ML418, suggesting that the polar side chain of T153 creates a barrier to low-affinity ligands that interact with E149 and A150. Reverse mutations in Kir1.1 suggest that this mechanism is conserved in other Kir channels. This study reveals a previously unappreciated role of membrane pore polarity in determination of Kir channel inhibitor pharmacology.
机译:Vu590是第一个公开公开的亚微粒溶剂亲和力(IC50 =0.2μm),内整流钾(KIR)通道和利尿靶的小分子抑制剂,Kir1.1。 VU590还抑制KIR7.1(IC50类似于8亩),已被用于揭示KIR7.1在肌瘤收缩和黑素素信号传导的调节中的新作用。在此,我们使用分子建模,诱变和膜片电生理学来阐明Vu590抑制作用Kir1.1和Kir7.1的分子机制。两种通道的块是电压 - 和K +依赖性,表明Vu590结合位点位于孔隙内。 Kir1.1中的诱变分析显示天冬酰胺171(N171)是高亲和力块所需的唯一孔隙残留物,并且在该位置替代带负电的残基(N171D,N171E)显着减弱块。相反,用Vu590增强kir7.1的等效位置以带负电荷的残余物代替Vu590,表明Vu590结合模式是不同的。有趣的是,Kir7.1中苏氨酸153(T153)的突变在该部位(T153C,T153V,T153S)下减少约束极性(T153C,T153V,T153S)使野生型和结合位点突变体(E149Q,A150s)对Vu590的阻滞更敏感。 Kir7.1-T153C突变通过结构不相关的抑制剂Vu714而增强嵌段,但不是由高亲和力的模拟ML418增强,表明T153的极性侧链为低亲和力配体产生与E149和A150相互作用的屏障。 KIR1.1中的反向突变表明这种机制在其他吉尔渠道中被保守。本研究揭示了膜孔极性在kir沟道抑制剂药理学测定中的先前未被覆富的作用。

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