首页> 外文期刊>Molecular crystals and liquid crystals >Low-voltage Sputtering Deposition of Transparent Conductive GAZO Thin Films for Minimizing Damage to Organic Layers
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Low-voltage Sputtering Deposition of Transparent Conductive GAZO Thin Films for Minimizing Damage to Organic Layers

机译:透明导电Gazo薄膜的低压溅射沉积,以使有机层损坏最小化

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摘要

Organic electronics devices could have many advantages such as flexibility, simple process and low fabrication cost. Minimizing damage to organic layers during sputtering is important for the improvement of organic optoelectronic performance and lifetime. In order to achieve improved device performance, degradation of organic layers, which could be occurring during manufacturing, should be suppressed. Among the methods available for the fabrication of transparent electrodes, sputtering deposition possess many advantage over others, such as simple apparatus and procedure, high deposition rate, and wide deposition area. [1] Because of its unique structure, the use of a facing targets sputtering (FTS) system could effectively reduce damage during sputtering. [2] In this study, we prepared transparent, organic, GAZO thin films deposited onto Alq3 using an FTS system for the purpose of investigating the damage caused to organic layer by sputter deposition. To measure the damage sustained by organic materials during sputter deposition, we carried out depositions of transparent, conductive, gallium-aluminum doped Zinc Oxide (GAZO) thin films onto organic layers, using an FTS system.
机译:有机电子设备可以具有许多优点,例如灵活性,简单的工艺和低制造成本。最小化溅射期间对有机层的损坏对于改善有机光电性能和寿命来说是重要的。为了实现改进的装置性能,应抑制在制造期间发生的有机层的劣化。在用于制造透明电极的方法中,溅射沉积具有许多优于对方的优势,例如简单的装置和程序,高沉积速率和宽沉积区域。 [1]由于其独特的结构,使用面向目标溅射(FTS)系统可以有效地降低溅射期间的损坏。 [2]在本研究中,我们使用FTS系统制备透明,有机,Gazo薄膜,用于通过溅射沉积研究对有机层造成的损伤。为了在溅射沉积期间测量有机材料造成的损坏,我们使用FTS系统对透明,导电,镓 - 铝掺杂氧化锌(GAZO)薄膜的沉积掺杂在有机层上。

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