The effect of carbon element on optical properties of n-doped Ge on silicon substrate

摘要

Highly n-doped Ge on Si has been demonstrated to be a promising candidate for the compatible light source with silicon technology. In the in-situ n-doping process of Ge epilayers, the active concentration is limited below 2 x 10(19) cm(-3) due to low solubility of dopant element in Ge matrix. Many dopant atoms are incorporated in the interstitial sites instead of substitution sites. We present a new approach to increase the electron concentration by adding carbon elements into P-doped Ge epilayers. A gain of PL intensity has been obtained with a factor of 2. The crystalline quality of the Ge film is also investigated owing to using a reflection high-energy electron diffraction (RHEED) apparatus and high-resolution transmission electron microscopy (HR-TEM). Phosphorus dopant is incorporated into Ge epilayers from specific GaP solid source.