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Acoustical-phonon and polaron mode-induced optical parametric amplification in transversely magnetized III-V semiconductors

机译:声波音和极化型模式诱导的横向磁化III-V半导体中的光学参数放大

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In this paper, a detailed analytical investigation is made to study the acoustical-phonon (AP) and polaron mode-induced optical parametric amplification (OPA) in transversely magnetized III-V semiconductors. Making use of hydrodynamic model of (one component) semiconductor plasma and adopting the coupled mode approach, an explicit expression is obtained for the threshold pump electric field (E-AP,E-LOP) and gain coefficients (g(AP,LOP)) of AP and polaron mode-induced OPA. Externally applied magnetostatic field (B0) and doping concentration (n(0)) are incorporated in terms of electron cyclotron frequency (omega(c)) and plasma frequency (omega(p)), respectively. The dependence of E-AP,E-LOP on wave number (k), omega(c) and omega(p) and the dependence of g(AP,LOP) on omega(c), omega(p) and pump electric field (E-0) are explored. Numerical estimates made for n-InSb-CO2 system suggest that the material parameters and externally applied magnetostatic field play an important role in reducing E-AP,E-LOP and enhancing g(AP,LOP). We find gLOP = 7.36 g(AP) (when omega(c) similar to omega(0)); though E-LOP is smaller than E-AP under identical conditions. The formulation developed in this paper highlights the importance of Frohlich interaction in transversely magnetized III{V semiconductors for OPA and replaces the conventional idea of using high power pulsed lasers. The results obtained in this analysis suggest that by controlling the material parameters and externally applied magnetostatic field, the performance of acoustical and polaron mode-induced optical parametric amplifiers may be improved. It is expected that a cheaper efficient optical parametric amplifier can be fabricated using n-InSb-CO2 system as the outcome of this research work.
机译:在本文中,对横向磁化的III-V半导体进行了详细的分析研究以研究声学 - 声子(AP)和PolarOn模式诱导的光学参数(OPA)。利用(一个组分)半导体等离子体的流体动力学模型并采用耦合模式方法,获得阈值泵电场(E-AP,E-LOP)和增益系数的显式表达式(G(AP,LOP)) AP和PolarOn模式引起的OPA。外部施加的磁场(B0)和掺杂浓度(N(0))分别掺入电子回旋频率(ω(C))和等离子体频率(ω(P))方面。 E-AP,E-LOP对波数(k),ω(c)和ω(p)的依赖性以及g(ap,leop)对ω(c),ω(p)和泵电场的依赖性(e-0)探讨。对N-INSB-CO2系统进行的数值估计表明,材料参数和外部施加的磁场在减少E-AP,E-LOP和增强G(AP,LOP)中起着重要作用。我们发现GLOP = 7.36克(AP)(当OMEGA(C)类似于OMEGA(0));虽然E-LOP在相同条件下小于E-AP。本文开发的制剂突出了Frohlich相互作用在横向磁化III {v半导体的opa中的重要性,并取代了使用高功率脉冲激光器的传统思想。在该分析中获得的结果表明,通过控制材料参数和外部施加的磁场,可以提高声学和偏振子模式感应光学参数放大器的性能。预计可以使用N-INSB-CO2系统制造更便宜的高效光学参数放大器作为本研究工作的结果。

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