Fabrication process induced changes in scattering parameters of meander type RFMEMS shunt switch

摘要

This paper reports about the effect of fabrication process induced changes on scattering parameters of RF MEMS switch structure with meander geometry for 18-40 GHz (Ka-band) application. The designed structure showed a return loss better than 15 dB with a maximum isolation of 43 dB at 35 GHz. From the parametric analysis, both the return loss and isolation parameters are found to be more dependent on the meander width and dielectric thickness compared to the other dimensions. The switch structure is fabricated by surface micromachining technique. The effect of variation of fabricated device dimensions, due to the various processing steps, on the isolation characteristic is also studied. The fabricated structure exhibited an on-off capacitance ratio of similar to 200:1. The pull-down voltage is found to be 12.5 V. The return loss of the fabricated switch structure is found to be better than 13.5 dB; whereas, the maximum isolation (32 dB) is observed at 33 GHz. The shift in the resonance is due to the reduction of silicon nitride layer thickness during sacrificial layer removal (to release the switch structure) in diluted HF solution. The measured scattering parameters are found to be matching well with the corresponding simulation data of the fabricated switch dimensions.