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Synthesis of Centimeter-Scale Monolayer Tungsten Disulfide Film on Gold Foils

机译:金箔上厘米级单层二硫化钨薄膜的合成

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We report the synthesis of centimeter-scale monolayer WS2 on gold foil by chemical vapor deposition. The limited tungsten and sulfur solubility in gold foil allows monolayer WS2 film growth on gold surface. To ensure the coverage uniformity of monolayer WS2 film, the tungsten source-coated substrate was placed in parallel with Au foil under hydrogen sulfide atmosphere. The high growth temperature near 935 degrees C helps to increase a domain size up to 420 mu m. Gold foil is reused for the repeatable growth after bubbling transfer. The WS2-based field effect transistor reveals an electron mobility of 20 cm(2) V-1 s(-1) with high on-off ratio of similar to 10(8) at room temperature, which is the highest reported value from previous reports of CVD-grown WS2 samples. The on-off ratio of integrated multiple FETs on the large area WS2 film on SiO2 (300 nm)/Si substrate shows within the same order, implying reasonable uniformity of WS2 FET device characteristics over a large area of 3 x 1.5 cm(2).
机译:我们报告了通过化学气相沉积在金箔上厘米级单层WS2的合成。金箔中有限的钨和硫溶解度允许单层WS2膜在金表面生长。为了确保单层WS2膜的覆盖均匀性,在硫化氢气氛下,将涂有钨源的基板与金箔平行放置。 935摄氏度附近的高生长温度有助于将磁畴尺寸增加到420微米。鼓泡转移后,金箔可重复使用以实现可重复的生长。基于WS2的场效应晶体管揭示了20 cm(2)V-1 s(-1)的电子迁移率,在室温下的高开关比与10(8)相似,这是以前报道的最高值CVD生长的WS2样品的报告。 SiO2(300 nm)/ Si基板上的大面积WS2膜上集成的多个FET的开-关比显示在同一顺序内,这意味着WS2 FET器件特性在3 x 1.5 cm(2)的大面积上具有合理的均匀性。

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