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Inverse Frequency Dependence of Forward Tone-on-Tone Masking Patterns

机译:前向音调掩蔽模式的反频率依赖性

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Forward tone-on-tone masking patterns were measured at frequencies 0.5, 1.0 and 2.0 kHz and sensation levels 20 dB SL and 60 dB SL in four normal hearing subjects using a modified 2-alternative forced choice procedure. At 60 dB SL the forward masking patterns have flat high frequency slope and steep low frequency slope. At 20 dB SL the forward masking patterns have slopes reversed with reference to their steepness, i.e. a steep high frequency slope and a flat low frequency slope. Thus a reversal of masking patterns is observed which occurs at a level between 60 and 20 dB SL. The data are in agreement with earlier observations on simultaneous masking.
机译:使用改进的2-替代强制选择程序,在四个正常听力受试者中,分别以0.5、1.0和2.0 kHz的频率以及20 dB SL和60 dB SL的感觉水平测量了正向音调掩蔽模式。在60 dB SL时,前向掩蔽模式具有平坦的高频斜率和陡峭的低频斜率。在20 dB SL时,前向掩蔽模式的斜率相对于其陡度是相反的,即陡峭的高频斜率和平坦的低频斜率。因此观察到掩蔽图案的反转发生在60至20dB SL之间的水平。该数据与先前关于同时掩蔽的观察结果一致。

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