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Removal of copper, nickel and tin from model and real industrial wastewater using sodium trithiocarbonate. The negative impact of complexing compounds

机译:用三合钠碳酸氢钠从模型和真正的工业废水中去除铜,镍和锡。 络合化合物的负面影响

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The possibility of Cu(II), Ni(II) and Sn(II) removal from model solutions and real wastewater from the production of PCBs using Na2CS3 for precipitation was presented in this paper. The testing was carried out on a laboratory scale using model and real industrial wastewater containing additives in the form of complexing compounds used in the production of PCBs (Na(2)EDTA, NH3(aq), thiourea) and recommended by the USEPA (Na(3)MGDA, Na(4)GLDA). Application of Na2CS3 in optimal conditions of conducting precipitation process was connected with obtaining wastewater containing low concentrations of metals (Cu 0.02 mg/L, Sn 0.01 mg/L, Ni 0.005 mg/L at pH 9.39 and Cu 0.07 mg/L, Sn 0.01 mg/L, Ni 0.006 mg/L at pH 7.79). Controlled application of Na2CS3 by the use of a platinum redox electrode was also connected with obtaining treated wastewater containing low concentrations of metals (Cu 0.019 mg/L, Sn 0.05 mg/L, Ni 0.0098 mg/L at pH 9-9.5 and E = -142 mV in the laboratory scale and Cu 0.058 mg/L, Sn 0.005 mg/L, Ni 0.011 mg/L at pH 9.14 and E = +10 mV in the industrial scale). Changing the value of redox potential of treated wastewater by dosing Na2CS3 made it possible to control the precipitation process on laboratory and industrial scale by the use of a platinum redox electrode. Controlled application of Na2CS3 can be used to remove Cu(II), Ni(II) and Sn(II) from industrial effluent containing chelating compounds like Na(2)EDTA, NH3(aq), thiourea, Na(3)MGDA and Na(4)GLDA.
机译:本文介绍了使用Na 2 CS3用于沉淀,从模型溶液和实际废水中除去模型溶液和实际废水的铜(II),Ni(II)和Sn(II)的可能性。使用含有络合化合物的模型和真正的工业废水的实验室规模进行了测试,其络合化合物的络合化合物(Na(2)EDTA,NH 3),硫脲)和USEPA推荐(NA (3)MGDA,NA(4)GLDA)。 Na 2 Cs3在导电沉淀过程的最佳条件下的应用与含有低浓度金属的废水(Cu 0.02mg / L,Sn <0.01mg / L,Ni <0.005mg / L,Cu 0.07 mg / L,Sn <0.01mg / L,Ni 0.006 mg / L,pH 7.79)。通过使用铂氧化还原电极的控制施用也与获得含有低浓度金属的处理废水(Cu 0.019mg / L,40.05mg / L,Ni <0.0098mg / L的pH 9- 9.5和E = -142mV在实验室标度和Cu 0.058mg / L,Sn <0.005mg / L,Ni 0.011mg / L,Ni 0.011mg / L在pH 9.14和E = +10mV的工业规模中)。通过使用铂氧化还原电极,通过使用铂氧化还原电极来改变经处理废水的氧化还原潜力的值使得可以通过使用铂氧化还原电极来控制实验室和工业规模的沉淀过程。 Na 2 Cs3的受控施加可用于除去含有螯合化合物的工业污水的Cu(II),Ni(II)和Sn(II),如Na(2)EDTA,NH 3(AQ),硫脲,NA(3)MgDA和Na (4)GLDA。

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