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首页> 外文期刊>Archives of Metallurgy and Materials >STUDIES ON CEMENTATION OF TIN ON COPPER AND TIN STRIPPING FROM COPPER SUBSTRATE
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STUDIES ON CEMENTATION OF TIN ON COPPER AND TIN STRIPPING FROM COPPER SUBSTRATE

机译:铜基材铜矿芯片胶粘研究

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摘要

Cementation of tin on copper in acid chloride-thiourea solutions leads to the formation of porous layers with a thickness dependent on the immersion time. The process occurs via Sn(II)-Cu(I) mechanism. Chemical stripping of tin was carried out in alkaline and acid solutions in the presence of oxidizing agents. It resulted in the dissolution of metallic tin, but refractory Cu3Sn phase remained on the copper surface. Electrochemical tin stripping allows complete tin removal from the copper substrate, but porosity and complex phase composition of the tin coating do not allow monitoring the process in unambiguous way.
机译:在酰氯 - 硫脲溶液中铜的胶化溶液导致形成多孔层,厚度取决于浸入浸渍时间。 通过SN(ii)-cu(i)机制发生该过程。 在氧化剂存在下在碱性和酸溶液中进行锡的化学汽提。 它导致金属锡的溶解,但难治性Cu3Sn相保持在铜表面上。 电化学锡剥离允许从铜基材上完全去除锡涂层的孔隙率和复合相组成,不允许以明确的方式监测该过程。

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