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首页> 外文期刊>Crystal growth & design >Influence of Local Magnetic Fields on P-Doped Si Floating Zone Melting Crystal Growth in Microgravity
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Influence of Local Magnetic Fields on P-Doped Si Floating Zone Melting Crystal Growth in Microgravity

机译:局部磁场对微重力作用下P掺杂硅浮区熔体晶体生长的影响

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摘要

A two-dimensional axisymmetric numerical model is presented to study the influence of local magnetic fields on P-doped Si floating zone melting crystal growth in microgravity. The model is developed based on the finite difference method in a boundary-fitted curvilinear coordinate system. Extensive numerical simulations are carried out, and parameters studied include the curved growth interface shape and the magnetic field configurations. Computed results show that the local magnetic field is more effective in reducing the impurity concentration nonuniformity at the growth interface in comparison with the longitudinal magnetic field. Moreover, the curved growth interface causes more serious impurity concentration nonuniformity at the growth interface than the case with a planar growth interface.
机译:提出了二维轴对称数值模型,研究了局部磁场对微重力作用下P掺杂Si浮区熔化晶体生长的影响。该模型是在边界拟合曲线坐标系中基于有限差分法开发的。进行了广泛的数值模拟,研究的参数包括弯曲的生长界面形状和磁场配置。计算结果表明,与纵向磁场相比,局部磁场在减少生长界面处的杂质浓度不均匀性方面更为有效。此外,与具有平坦的生长界面的情况相比,弯曲的生长界面导致在生长界面处更严重的杂质浓度不均匀性。

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