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Synthesis and characterization of Ge-doped GaN crystalline powders deposited on graphite and silica glass substrates

机译:石墨和二氧化硅玻璃衬底上沉积的掺Ge GaN结晶粉末的合成与表征

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摘要

Gallium nitride (GaN) powders doped with various amounts of Ge were deposited at 1000 and 1180 degrees C on graphite and silica glass substrates by a 1-h reaction of NH3 with gaseous Ga2O and GeO, produced by the reaction of carbon with Ga2O3 and GeO2, respectively. The crystallinity of the GaN powders was determined by X-ray diffraction (XRD) and Raman spectroscopy, and their morphology was observed by scanning electron microscopy. The luminescence of the powders was measured at room temperature by cathodoluminescence (CL) to evaluate the quality of the GaN crystals. The influence of Ge-doping of the GaN powders on their crystallinity, morphology, and luminescence is discussed on the basis of the XRD, Raman spectroscopy, and CL results. It is shown that Ge-doped GaN crystals exhibit very high CL intensities accompanied by the elimination of defect-related emission at 430 nm.
机译:通过NH3与气态Ga2O和GeO的1-h反应(碳与Ga2O3和GeO2的反应产生),在1000和1180摄氏度下,将掺杂有各种Ge的氮化镓(GaN)粉末沉积在石墨和石英玻璃基板上。 , 分别。 GaN粉末的结晶度通过X射线衍射(XRD)和拉曼光谱法测定,并且其形态通过扫描电子显微镜观察。在室温下通过阴极发光(CL)测量粉末的发光,以评估GaN晶体的质量。根据XRD,拉曼光谱和CL结果,讨论了GaN粉末的Ge掺杂对其结晶度,形态和发光的影响。结果表明,掺Ge的GaN晶体具有很高的CL强度,并消除了430 nm处与缺陷有关的发射。

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