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首页> 外文期刊>Crystal growth & design >Influence of Oxygen Partial Pressure during Growth on Optical and Electrical Properties of Ca3TaAl3Si2O14 Single Crystals
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Influence of Oxygen Partial Pressure during Growth on Optical and Electrical Properties of Ca3TaAl3Si2O14 Single Crystals

机译:生长过程中的氧分压对Ca3TaAl3Si2O14单晶光学和电学性质的影响

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摘要

Among the langasite family, Ca3TaAl3Si2O4 (CTAS) is particularly promising for high temperature sensor applications due to its relatively high resistivity. In this work, CTAS single crystals have been grown by the Czochralski technique under various oxygen partial pressures using Ir and Pt crucibles. Colorless CTAS crystals were grown for the first time; however, the elimination of related defects did not influence the electrical properties. Furthermore, dielectric and piezoelectric properties were independent of growth conditions. Instead, the electrical resistivity was found to be remarkably higher the lower the oxygen partial pressure, reaching a value of similar to 7 X 10(10) Q cm at 400 degrees C, which is 3 orders of magnitude higher than that of disordered LTGA. Therefore, grown CTAS crystals are promising for high temperature piezoelectric sensor applications.
机译:在浮硅石家族中,Ca3TaAl3Si2O4(CTAS)由于其相对较高的电阻率而特别适用于高温传感器应用。在这项工作中,通过Czochralski技术使用Ir和Pt坩埚在各种氧气分压下生长了CTAS单晶。首次生长出无色CTAS晶体。但是,消除相关的缺陷不会影响电性能。此外,介电和压电特性与生长条件无关。取而代之的是,发现氧分压越低,电阻率就越高,在400摄氏度下达到类似于7 X 10(10)Q cm的值,这比无序LTGA高3个数量级。因此,生长的CTAS晶体有望用于高温压电传感器应用。

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