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Paraffin Wax Crystal Coarsening: Effects of Strain and Wax Crystal Shape

机译:石蜡蜡晶体粗化:应变和蜡晶体形状的影响

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We developed a model of paraffin wax crystal coarsening that well describes our experimental results and allows the behavior of the paraffin films to be predicted on the basis of the extracted kinetic parameters. Wax crystalline films were evaporated on different substrates (silicon wafer, glass slide, thin layer of gold on silicon), thermally treated at different temperatures (25-60 degrees C), and investigated by powder X-ray diffraction, high-resolution scanning electron microscopy, and optical confocal imaging of the surfaces. A preferred (110) crystal orientation of all deposited wax films, independent of substrate type, was observed from the start and increased during heat treatment. The change in preferred orientation was accompanied by changes in crystal morphology and shape, resulting in surface nanoroughening. We modeled the process as the coarsening of oriented C36H74 crystal islands driven by the decrease in total surface energy. Coarsening kinetics was controlled by diffusion of single molecular chains along the substrate. Evolution of nanoroughness during annealing time was well described by a surface coarsening law, H-r similar to t(1/4). Two additional factors influenced the evolution rate: strains accumulated in wax crystals during deposition, and the initial crystal shape diverged from the shape at equilibrium. Both factors lowered activation energy and effectively shortened coarsening time.
机译:我们开发了石蜡蜡晶体粗化模型,该模型很好地描述了我们的实验结果,并允许根据提取的动力学参数预测石蜡膜的行为。蜡状结晶膜在不同的基板(硅晶片,玻璃片,硅上的金薄层)上蒸发,在不同的温度(25-60摄氏度)下进行热处理,并通过粉末X射线衍射,高分辨率扫描电子进行研究显微镜和表面的光学共聚焦成像。从一开始就观察到所有沉积蜡膜的优选(110)晶体取向,与基材类型无关,并在热处理过程中增加。优选取向的变化伴随着晶体形态和形状的变化,导致表面纳米粗糙化。我们将过程建模为由总表面能的降低驱动的定向C36H74晶体岛的粗化。粗化动力学通过单分子链沿底物的扩散来控制。通过表面粗化定律H-r与t(1/4)相似,很好地描述了退火过程中纳米粗糙度的演变。另外两个因素影响了析出速率:沉积过程中蜡晶体中积累的应变以及初始晶体形状与平衡时的形状有所不同。这两个因素均降低了活化能并有效缩短了粗化时间。

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