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首页> 外文期刊>Acta Mechanica >Deflection and stability of membrane structures under electrostatic and Casimir forces in microelectromechanical systems
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Deflection and stability of membrane structures under electrostatic and Casimir forces in microelectromechanical systems

机译:微机电系统中静电力和卡西米尔力作用下膜结构的挠度和稳定性

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摘要

The deflection and stability of microfabricated rectangular membrane strips driven electrostatically are analyzed theoretically in this paper with the attractive Casimir force between the conducting surfaces under consideration. The analytical results of the deflection of the membrane strip under the combined electrostatic and Casimir forces show that the effect of the Casimir force on the deflection is dependent on the values of the initial gap between the membrane and the substrate w(0), the applied voltage V and the fourth power of span to thickness ratio L-4/h. The Casimir effect on the membrane system is dominant for smaller gap w(0) and lower voltage V. yet it decreases with the gap width and the voltage increasing. When the value of w(0) and V is large enough, it is feasible to neglect the Casimir force. The Casimir effect on the deflection increases with the increasing L-4/H as well. The static stability of the membrane structure can be determined by a dimensionless parameter K related to the geometrical parameters of the membrane structure. The critical value K-C, over which the system will become unstable and the membrane strip will collapse to the substrate, is solved through numerical calculations, and it is found that an electrostatically driven membrane structure can be designed to avoid the potential instability with a high aspect ratio (L/h).
机译:本文通过考虑导电表面之间的卡西米尔吸引力,从理论上分析了静电驱动的超细矩形矩形薄膜条的挠度和稳定性。静电和卡西米尔力共同作用下膜条的挠度分析结果表明,卡西米尔力对挠度的影响取决于膜与基材之间的初始间隙值w(0),电压V和跨度与厚度比的四次方L-4 / h。对于较小的间隙w(0)和较低的电压V,对膜系统的卡西米尔效应占主导地位,但随着间隙宽度的增加和电压的增加,卡西米尔效应减小。当w(0)和V的值足够大时,忽略卡西米尔力是可行的。卡西米尔对挠度的影响也随着L-4 / H的增加而增加。膜结构的静态稳定性可以由与膜结构的几何参数有关的无量纲参数K确定。通过数值计算解决了临界值KC,在该临界值上系统会变得不稳定并且膜条会塌陷到基材上,并且发现可以设计静电驱动的膜结构来避免潜在的不稳定性。比(L / h)。

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