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首页> 外文期刊>Acta metallurgica Sinica >PREPARATION AND SURFACE CHARACTERIZATION OF TiO_2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD
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PREPARATION AND SURFACE CHARACTERIZATION OF TiO_2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD

机译:磁控溅射法在玻璃上制备TiO_2薄膜及其表面表征

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摘要

Ti thin films were firstly deposited on glass substrates by magnetron sputtering method, then sintered the Ti thin films in air atmosphere and finally TiO_2 transparence thin films on glass substrates were obtained. The structure and surface morphologies of the thin films were characterized by X-ray diffraction and SEM The growth process of the thin films has been observed. The annealing time and annealing temperatures have an affect on the growth of the films.
机译:首先通过磁控溅射法在玻璃基板上沉积Ti薄膜,然后在大气中烧结Ti薄膜,最后在玻璃基板上获得TiO_2透明薄膜。通过X射线衍射和SEM表征了薄膜的结构和表面形貌。观察到了薄膜的生长过程。退火时间和退火温度对膜的生长有影响。

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