首页> 外文期刊>Bulletin of Materials Science >Mathematical model of Boltzmann's sigmoidal equation applicable to the set-up of the RF-magnetron co-sputtering in thin films deposition of BaxSr1-xTiO3
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Mathematical model of Boltzmann's sigmoidal equation applicable to the set-up of the RF-magnetron co-sputtering in thin films deposition of BaxSr1-xTiO3

机译:Boltzmann的数学模型适用于Baxsr1-xtio3薄膜薄膜沉积RF-agmetron共溅射设置的矩形方程

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In this work, we present the stoichiometric behaviour of Ba(2+)and Sr2+ when they are deposited to make a solid solution of barium strontium titanate. BaxSr1-xTiO3 (BST) thin films of nanometric order on a quartz substrate were obtained by means of in-situ RF-magnetron co-sputtering at 495 degrees C temperature, applying a total power of 120 W divided into intervals of 15 W that was distributed between two magnetron sputtering cathodes containing targets of BaTiO3 and , as SrTiO3, follows: 0-120, 15-105, 30-90, 45-75, 60-60, 75-45, 90-30, 105-15 and 120-0 W. Boltzmann's sigmoidal modified equation (Boltzmann's profile) is proposed to explain the behaviour and the deposition ratio Ba/Sr of the BST as a function of the RF-magnetron power. The Boltzmann's profile proposal shows concordance with experimental data of deposits of BST on substrates of nichrome under the same experimental conditions, showing differences in the ratio Ba/Sr of the BST due to the influence of the substrate.
机译:在这项工作中,当沉积它们的钛酸钡溶液的固体溶液沉积时,我们介绍了Ba(2+)和Sr2 +的化学计量行为。 通过在495℃的温度下,通过原位RF-磁控管在495℃的温度下溅射获得石英基板上的纳米序列的BAXSR1-Xtio3(BST)薄膜,将120W的总功率分为15W的间隔 分布在含有BATIO3的靶标的两种磁控溅射阴极之间,如SRTIO3,如下:0-120,15-105,30-90,45-75,60-60,75-45,90-30,105-15和120 -0 W.Boltzmann的S形修改式等式(Boltzmann的配置文件)被提出以解释BST的行为和沉积比Ba / Sr作为RF-磁控管功率的函数。 Boltzmann的个人资料提案在相同的实验条件下,在相同的实验条件下,在幼肠基质上的BST沉积物的实验数据表明,由于基材的影响,BS / Sr的比例Ba / Sr的比例差异。

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