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Casimir free energy of dielectric films: classical limit, low-temperature behavior and control

机译:介电薄膜的自由能量:经典极限,低温行为和控制

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摘要

The Casimir free energy of dielectric films, both free-standing in vacuum and deposited on metallic or dielectric plates, is investigated. It is shown that the values of the free energy depend considerably on whether the calculation approach used neglects or takes into account the dc conductivity of film material. We demonstrate that there are material-dependent and universal classical limits in the former and latter cases, respectively. The analytic behavior of the Casimir free energy and entropy for a free-standing dielectric film at low temperature is found. According to our results, the Casimir entropy goes to zero when the temperature vanishes if the calculation approach with neglected dc conductivity of a film is employed. If the dc conductivity is taken into account, the Casimir entropy takes the positive value at zero temperature, depending on the parameters of a film, i.e. the Nernst heat theorem is violated. By considering the Casimir free energy of SiO2 and Al2O3 films deposited on a Au plate in the framework of two calculation approaches, we argue that physically correct values are obtained by disregarding the role of dc conductivity. A comparison with the well known results for the configuration of two parallel plates is made. Finally, we compute the Casimir free energy of SiO2, Al2O3 and Ge films deposited on high-resistivity Si plates of different thicknesses and demonstrate that it can be positive, negative and equal to zero. The effect of illumination of a Si plate with laser light is considered. Possible applications of the obtained results to thin films used in microelectronics are discussed.
机译:研究了介电薄膜的自由膜的可自由能,既有固定在金属或介电板上都是固定的真空和沉积。结果表明,自由能量的值相当依赖于是否忽视的计算方法或考虑薄膜材料的直流电导率。我们证明,前者和后一种情况下存在具有重要的依赖和普遍的古典限制。发现了低温下独立式电介质膜的Casimir自由能和熵的分析行为。根据我们的结果,如果采用具有薄膜的忽略直流电导率的计算方法,温度消失,则Casimir熵将变为零。如果考虑到直流电导率,则根据薄膜的参数,Casimir熵在零温度下以零温度呈正值,即违反了内部的NERNST热定理。通过考虑SiO2和Al2O3沉积在两个计算方法的框架中SiO2和Al2O3薄膜的自由能,我们认为通过忽视直流电导率的作用来获得物理校正的值。制造与两个平行板的配置的众所周知的结果进行比较。最后,我们计算SiO2,Al2O3和Ge薄膜的Casimir自由能量,沉积在不同厚度的高电阻率Si板上,并证明它可以是正,阴性和等于零。考虑了Si板与激光照射的影响。讨论了所得结果对微电子中使用的薄膜的可能应用。

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