首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Ferromagnetism induced by point defect in Janus monolayer MoSSe regulated by strain engineering
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Ferromagnetism induced by point defect in Janus monolayer MoSSe regulated by strain engineering

机译:应变工程监管Janus Monolayer Mosse的点缺陷诱导的铁磁性

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摘要

The formation and regulation of magnetism dependent on introduced defects in the Janus MoSSe monolayer has attracted much attention because of its potential application in spintronics. Here, we present a theoretical study of defect formation in the MoSSe monolayer and its introduced magnetism under external strain. The tensile deformation induced by external strain not only leads to decreases in defect formation energy, but also enhances magnetic characteristics. However, as compressed deformation increases, the magnetism in the structure induced by Se or S defects remains unchanged because this microstructural deformation adequately spin polarizes unpaired electrons of neighboring Mo atoms. Our results suggest the use of point defect and strain engineering in the Janus MoSSe monolayer for spintronics applications.
机译:由于其在闪光灯中的潜在应用,因此依赖于Janus Mosse Monolayer中引入的缺陷的形成和调节引起了很多关注。 在这里,我们在外部应变下展示了Mosse Monolayer中的缺陷形成的理论研究及其引入的磁。 外部应变引起的拉伸变形不仅导致缺陷形成能量的降低,而且增强了磁特性。 然而,随着压缩变形的增加,由Se或S缺陷诱导的结构中的磁性保持不变,因为这种微观结构变形充分自旋邻近莫原子的未配对电子。 我们的结果表明,在Janus Mosse Monolayer中使用点缺陷和应变工程,用于SpintRonics应用。

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