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Annealing of silicon carbonitride nanostructured thin films: interdependency of hydrogen content, optical, and structural properties

机译:碳氮化碳纳米结构薄膜的退火:氢含量,光学和结构性能的相互依赖性

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摘要

Silicon carbonitride (SiCxNy) materials, inspired by their outstanding multifunctional properties, are finding increasing applications in a variety of fields, including as next generation solar cells and hard coatings. Hydrogenated SiCxNy thin films, along with binary submatrices of stoichiometric SiC and SiN3 as a reference, were deposited using electron cyclotron resonance plasma-enhanced chemical vapor deposition. We described a comparative study of the effects of post-deposition thermal annealing, from 300 to 1200 A degrees C, on the evolution of hydrogen-rich a-SiC1.2N0.7:H-1.4 thin films. Concurrently, two featured annealing temperatures (500 and 900 A degrees C) were found to have the significant influence on the morphology, optical, and microstructural properties of the films. During annealing the amorphous phase of SiC1.2N0.7:H-1.4 thin films was fully maintained according to the transmission electron microscopy and X-ray diffraction analyses. The hydrogen density was quantitatively analyzed employing two different experimental techniques, elastic recoil detection and Fourier transform infrared spectroscopy, showing the associate annealing temperatures of hydrogen desorption, breaking of all hydrogen-terminated bonds, and depletion of all hydrogen content. The refractive indices and optical band gap of the films were calculated using variable angle spectroscopic ellipsometer. Thermal annealing resulted in hydrogen desorption and consequently layer densification along with an increase in the refractive index. During the annealing process, first the optical band gap widened, and then narrowed due to hydrogen out-diffusion or chemical bond restructuring, depending on the annealing temperature. In addition, Rutherford backscattering spectrometry and X-ray photoelectron spectroscopy were performed. These findings are discussed in the context of the interdependency of the hydrogen desorption and thermally induced changes in chemical bonds, mass density, and optic
机译:受其出色的多功能性质的启发的碳腈(SiCXNY)材料在各种领域中寻找越来越多的应用,包括作为下一代太阳能电池和硬涂层。使用电子回旋共振等离子体增强的化学气相沉积,沉积氢化的SiCXNY薄膜,以及化学计量SiC和SIN3作为参考的二进制子分泌物。我们描述了对沉积后热退火的影响的比较研究,从300至1200℃,富含氢A-SiC1.2N0.7:H-1.4薄膜的演变。同时,发现两个精选的退火温度(500和900℃)对薄膜的形态,光学和微观结构性质具有显着影响。在退火期间,根据透射电子显微镜和X射线衍射分析完全保持SiC1.2N0.7:H-1.4薄膜的无定形相。定量分析氢密度采用两种不同的实验技术,弹性反冲检测和傅里叶变换红外光谱,显示氢解吸,破碎所有氢封端键的助性退火温度,以及所有氢含量的耗尽。使用可变角度光谱椭圆仪计算膜的折射率和光学带隙。热退火导致氢解吸,因此层致密化以及折射率的增加。在退火过程中,首先,光带间隙加宽,然后由于氢气过扩散或化学键重组而变窄,这取决于退火温度。另外,进行了Rutherford反向散射光谱法和X射线光电子能谱。这些发现在氢解吸和热诱导的化学键,质量密度和光学中的热诱导变化的背景下讨论了这些发现

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  • 来源
    《Journal of Materials Science》 |2018年第2期|共17页
  • 作者单位

    McMaster Univ Dept Engn Phys Hamilton ON L8S 4L7 Canada;

    McMaster Univ Dept Engn Phys Hamilton ON L8S 4L7 Canada;

    McMaster Univ Dept Engn Phys Hamilton ON L8S 4L7 Canada;

    McMaster Univ Dept Engn Phys Hamilton ON L8S 4L7 Canada;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
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