Patterning thermoplastic polymers by fast room-temperature imprinting

摘要

To avoid the high-temperature process of thermal imprinting, the room-temperature imprint lithography was proposed to pattern thermoplastic polymers. However, the room-temperature imprint lithography is still limited by rigorous condition of high pressure and wasting time. In order to overcome the above-mentioned disadvantages, we have introduced a fast (5 s) imprint method, which is based on the difference of two interfacial forces, to pattern thermoplastic polymers under room-temperature without additional pressure. This method is appropriate for the flat substrate, the curved substrate and the flexible substrate. Furthermore, we also have successfully fabricated 3D hierarchical patterns with antireflection by this method.