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Electron beam domain writing in reduced LiNbO3 crystals

机译:电子束域在缩小的LINBO3晶体中写入

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Electron-beam domain writing (DEBW) on the nonpolar surfaces of reduced LiNbO3 crystals was studied. Essential distinctions were found as compared with DEBW in as-grown congruent LiNbO3 crystals (CLN). The threshold dose D-thr of domain emerging in reduced LiNbO3 (RLN) exceeds essentially D-thr in CLN, which is related to a decreased space-charge Q(sc) in the irradiated area due to the increase of the bulk leakage current Ibulk L. The shape of domain gratings in RLN differs from that in CLN because of an increased dark conductivity. The velocity of domain-wall frontal motion in RLN is more than by a factor of 20 lower than in CLN, which is due both to a decreased Q(sc) and to an essential reduction of the domain-wall mobility. All these effects related to a fundamental change of the charge transport in RLN are discussed in the framework of the current model of the LiNbO3 defect structure. The results obtained show that the only path to realize DEBW in crystals with varied conductance is the adjustment of EB current density. Published by AIP Publishing.
机译:研究了LiNBO3晶体的非极性表面上的电子束域写(Debw)。与生长的全体LINBO3晶体(CLN)相比,找到了基本的区分。在减少的LINBO3(RLN)中出现的域的阈值剂量D-THR在CLN中基本上是D-THR,其与照射区域中的下降空间电荷Q(SC)有关,由于散装漏电流Ibulk的增加L.由于暗导率增加,RLN中的畴光栅的形状与CLN中的相差不同。 RLN中的域壁前运动的速度大于20位于CLN的倍数,这两者都是由于降低的Q(SC)和畴壁移动性的基本降低。在LINB3缺陷结构的当前模型的框架中讨论了与RLN中电荷传输的基本变化相关的所有这些效果。得到的结果表明,实现具有变化电流的晶体中的刚性的唯一路径是调整EB电流密度。通过AIP发布发布。

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