首页> 外文期刊>Journal of Electronic Materials >Current-Transport Mechanisms of the Al/(Bi2S3-PVA Nanocomposite)/p-Si Schottky Diodes in the Temperature Range Between 220K and 380K
【24h】

Current-Transport Mechanisms of the Al/(Bi2S3-PVA Nanocomposite)/p-Si Schottky Diodes in the Temperature Range Between 220K and 380K

机译:Al /(Bi2S3-PVA纳米复合材料)/ P-Si肖特基二极管的电流传输机制在220k和380K之间的温度范围内

获取原文
获取原文并翻译 | 示例
           

摘要

In this research, bismuth sulfide nanostructures were prepared in the presence of polyvinyl alcohol (PVA) as a capping agent by an ultrasound-assisted method. The x-ray diffraction results show the crystalline phase of the sample and the mean crystalline size estimated by Debye-Scherer's equation. The UV-Vis absorption spectrum show that the optical absorbance edge of Bi2S3 nanostructure was blue-shifted. The Fourier transform infrared spectra confirm the presence of PVA in the sample and transmission electron microscopy imaging shows that the structures are in nanoscale. The semi-logarithmic forward bias I-V plots have two distinct linear regimes for each temperature which are called low- and moderate-bias regions (LBR and MBR). In order to effectively interpret possible current-conduction/transport mechanisms, the reverse saturation current (I-o), ideality factor (n) and zero-bias barrier height (phi(BO)) were obtained from the slope and intercept of these plots and they were found to be a strong function of temperature and voltage. The high value of n even at high temperature and the increase of phi(BO) with increasing temperature for the two regions is clear evidence of the deviation from thermionic emission (TE) theory. Therefore, phi(BO) versus n and q/2kT plots were drawn to get evidence of the Gaussian distribution (GD) of the barrier height (BH) and they show a linear behavior. The mean values of BH phi BO and standard deviation (sigma(s)) were also obtained from the intercepts and slopes of the phi(BO) versus q/2kT plots as 1.44 eV and 0.19 V for the LBR and 1.32 eV and 0.18 V for the MBR, respectively. After that, the values phi BO documentclass [12pt]{-69pt} and effective Richardson constant (A(*)) were obtained as 1.29 eV and 267.6A/(cm K)(2) for the LBR and 1.27eV and 281.7A/(cm K)(2) for the MBR, respectively. Such non-ideal I-V-T characteristics for the Al/(PVA-Bi2S3)/p-Si structure can be successfully explained by the single GD of BH for the LBR and MBR.
机译:在该研究中,通过超声辅助方法在聚乙烯醇(PVA)存在下制备硫化物纳米结构作为覆盖剂。 X射线衍射结果显示样品的结晶相和由Debye-Scherer方程估计的平均晶体尺寸。 UV-Vis吸收光谱表明Bi2S3纳米结构的光学吸光度边缘是蓝移位的。傅里叶变换红外光谱确认样品中的PVA的存在,透射电子显微镜成像表明结构是纳米级。半对数前向偏置I-V图具有两个称为低位偏置区域(LBR和MBR)的每个温度的两个不同的线性状态。为了有效地解释可能的电流导通/传送机制,从这些图的斜坡和截距获得反向饱和电流(IO),理想因子(N)和零偏置障碍高度(PHI(BO))被发现是温度和电压的强功能。即使在高温下,N的高值也具有增加的两个地区温度的PHI(BO)的升高是与热离子发射(TE)理论的偏差的明确证据。因此,绘制了PHI(BO)与N和Q / 2KT图来获取屏障高度(BH)的高斯分布(GD)的证据,并且它们显示出线性行为。 BH Phi Bo和标准偏差的平均值也从PHI(BO)的截距和斜坡与Q / 2KT曲线为1.44eV和0.19V的1.32eV和0.18 V分别为MBR。之后,PHI BO DocumentClass [12pt] {-69pt}和有效的Richardson常数(a(*))获得为1.29eV和267.6A /(cm K)(2),用于1.27ev和281.7a /(cm k)(2)分别用于MBR。可以通过LBR和MBR的单个GD成功解释Al /(PVA-BI2S3)/ P-Si结构的这种非理想I-V-T特性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号