首页> 外文期刊>Journal of Electronic Materials >Cu2ZnSnS4 Thin Films by Dip Coating from Metal-Thiourea Precursor Solution: Effect of Sulphurization Temperature on the Formation and Structural, Optical and Electrical Properties
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Cu2ZnSnS4 Thin Films by Dip Coating from Metal-Thiourea Precursor Solution: Effect of Sulphurization Temperature on the Formation and Structural, Optical and Electrical Properties

机译:Cu2ZNSS4薄膜通过金属 - 硫脲前体溶液浸涂:硫化温度对形成和结构,光学和电气性能的影响

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摘要

A process for fabrication of kesterite-based Cu2ZnSnS4 (CZTS) thin films from metal-thiourea precursor solution by dip coating is described. As deposited CZTS films were sulphurized at different temperatures to study the effects of sulphurization temperature on structural, optical and electrical properties. Formation of tetragonal CZTS phase was confirmed by x-ray diffraction; phase purity of the films was further studied by Raman spectroscopy. The studies revealed phase pure crystal structure for the films sulphurized at 500A degrees C and 550A degrees C. Larger crystallite size was observed for films sulphurized at 550A degrees C. Scanning electron microscopy studies showed uniform distribution of particles in the film sulphurized at 550A degrees C, and the determined thickness of the films was similar to 2 mu m. Energy dispersive x-ray spectroscopy analysis revealed the effect of sulphurization temperature on elemental compositions of the films. Optical studies suggest that CZTS thin film sulphurized at 550A degrees C has high absorption coefficient (10(5) cm(-1)) with an optical energy band gap of 1.43 eV. P-type nature of the films was confirmed from Hall Effect analysis. Carrier concentration, mobility and resistivity of the films sulphurized at 550A degrees C were also calculated. The study optimized fabrication conditions for device quality CZTS thin films from metal-thiourea precursor solution by simple dip coating.
机译:描述了通过浸涂制备从金属 - 硫脲前体溶液的基于基于KETETITE的CU2ZNS4(CZTS)薄膜的方法。沉积的CZTS薄膜在不同温度下硫化量,以研究硫化温度对结构,光学和电性能的影响。通过X射线衍射确认四边形CZTS相的形成;通过拉曼光谱研究进一步研究膜的相纯度。该研究揭示了在500A的C和550A℃下硫化致密的膜的相纯晶体结构。对于在550A℃下硫化的薄膜观察到较大的微晶尺寸。扫描电子显微镜研究显示在550A℃下硫化薄膜中颗粒的均匀分布。并且确定的薄膜的厚度类似于2μm。能量分散X射线光谱分析显示硫化温度对薄膜元素组​​合物的影响。光学研究表明,在550A℃下硫化的CZTS薄膜具有高吸收系数(10(5 )cm(-1)),光学能带隙为1.43eV。从霍尔效应分析证实了薄膜的p型性质。还计算载体浓度,迁移率和在550A℃下硫化的薄膜的电阻率。通过简单的浸涂,研究优化了用于从金属 - 硫脲前体溶液中获得薄膜的制造条件。

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