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PL investigations of spin coated thin films of porous SiC powder embedded in PVA

机译:PVA中嵌入多孔SiC粉末旋涂薄膜的PL研究

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Spin coated thin films of pure Poly Vinyl Alcohol (PVA) and PVA mixed with porous SiC microparticles were prepared in order to be used in an optical device. An electroless method was used for producing porous silicon carbide powder under UV irradiation was investigated. The electroless process was chosen because it does not require electrical contact during etching like in anodic one. Silver nanolayer coated SiC particles was formed by polyol process prior the etching and served both as an anode, catalyst and mask for the reduction of a chemical oxidant. The etchant was composed of HF and different oxidants in water. Various porous morphologies are presented and studied as a function of etchant concentration, oxidant type, etching time, and wavelength of irradiation. Morphological, optical and photoluminescence characterizations of SiC micropowder embedded in PVA matrix and deposited as thin films on glass substrates are reported. We concluded that the chemical etching conditions of SiC powder seems to have a large impact on the resulting properties. We noticed that thin film based on SiC powder etched under UV light of 254 nm using K2S2O8 as oxidant, at reaction temperature of 80 degrees C for t = 40min exhibited the best photoluminescence property. (C) 2017 Elsevier B.V. All rights reserved.
机译:制备旋转涂覆的纯聚乙烯醇(PVA)和与多孔SiC微粒混合的PVA的薄膜,以便用于光学装置。在研究UV照射下,使用过滤方法在紫外线照射下产生多孔碳化硅粉末。选择化学镜头,因为在蚀刻在阳极蚀刻期间不需要电触点。通过多元醇工艺在蚀刻和用作减少化学氧化剂的阳极,催化剂和掩模中,通过多元醇工艺形成银纳米组涂覆的SiC颗粒。蚀刻剂由水中的HF和不同氧化剂组成。呈现和研究各种多孔形态,作为蚀刻剂浓度,氧化剂型,蚀刻时间和照射波长的函数。据报道了PVA基质中的SiC微隆的形态学,光学和光致发光特征,并作为玻璃基板上的薄膜沉积。我们得出结论,SiC粉末的化学蚀刻条件似乎对所得性质产生很大影响。我们注意到,使用K2S2O8作为氧化剂在254nm的UV光下蚀刻薄膜,在80℃的反应温度下,T = 40min表现出最佳的光致发光性。 (c)2017年Elsevier B.V.保留所有权利。

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