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Electrochemical deposition and characterization of ZnOS thin films for photovoltaic and photocatalysis applications

机译:光伏和光电催化应用ZnOS薄膜的电化学沉积及表征

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Electrochemical deposition of zinc oxysulphide (ZnOS) thin films for possible photovoltaic and photocatalysis applications has been carried out using zinc acetate and sodium thiosulphate precursors in a simple two-electrode deposition set-up. The deposited films were characterized for their structural, optical, morphological and compositional properties using glancing incidence X-ray diffraction (GIXRD), UV-Vis spectrophotometry, scanning electron microscopy (SEM) and energy-dispersive X-ray (EDX) spectroscopy respectively. The detailed characterization results show that the ZnOS materials grown at different cathodic potentials of 1450 mV, 1500 mV and 1550 mV display desirable properties for the intended applications. Structural analysis shows that the films were formed by a combination of hexagonal ZnS and ZnO crystal phases. The energy bandgap estimated for the films across the explored potentials is in the range (2.68-3.26) eV for as-deposited films and (2.90-3.10) eV after annealing. These values and the transmittance were also shown to be increased significantly by reducing the deposition duration. SEM images show very compact and densely packed grains in the films while EDX results show Zn/S values of approximately unity and Zn/O values of approximately 0.1 across the deposition potentials explored, in both as-deposited and annealed conditions. (c) 2018 Elsevier B.V. All rights reserved.
机译:锌氧化锌(ZnOS)薄膜用于可能的光伏和光催化应用的电化学沉积已经在简单的双电极沉积设置中使用锌氧化锌和硫代硫酸钠前体进行。沉积的薄膜的特征在于,使用透明发射X射线衍射(GixRD),UV-Vis分光光度法,扫描电子显微镜(SEM)和能量分散X射线(EDX)光谱分别的结构,光学,形态学和组成特性。详细表征结果表明,ZnOS材料在1450mV,1500mV和1550mV显示所预期应用的期望性质的不同阴极电位下生长。结构分析表明,膜由六边形ZnS和ZnO晶相的组合形成。在探索电位上估计的薄膜的能量带隙在退火后的沉积薄膜和(2.90-3.10)EV的范围内(2.68-3.26)。这些值和透射率也通过降低沉积持续时间而显着增加。 SEM图像在薄膜中显示出非常紧凑且密集的堆叠,而EDX结果在探索的沉积和退火条件下显示ZN / S值约为0.1的大约0.1的Zn / O值。 (c)2018年elestvier b.v.保留所有权利。

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