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Defects engineering monolayer MoSe2 magnetic states for 2D spintronic device

机译:缺陷工程单层MOSE2磁力状态为2D旋转式装置

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摘要

The effects of vacancy and antisite defects, such as V-Mo, V(Mo2 )far, V-Mo2 close, V-Se , V-Se2 close, V-MoSe3, V-MoSe6 and Mo-Se2 on the electronic structure and magnetic properties of monolayer MoSe2 were systematically investigated using the density functional theory calculation. The theoretical results indicate that the single Mo vacancy (V-Mo ) induces a large magnetic moment of 3.939 mu(Beta) and shows magnetic halfmetallicity due to the Se unsaturated dangling bond around the Mo vacancies. Effective n-type doping can be achieved by the creation of Se vacancy (V-Se and V-Se2 ). However, the Se vacancy doped systems are nonmagnetic due to the formation of Mo-Mo metallic bonds around the Se vacancies, which results in the disappearance of Mo unsaturated dangling bonds. The V-MoSe3 and V-MoSe6 complex defects as well as Mo-Se2 antisite defect have high formation energy of defects. The V-MoSe3 remains nonmagnetic. However, the V-MoSe6 and Mo-Se2 defects induce a magnetic moment of 5.74 mu(Beta) and 1.92 mu(Beta), respectively, which originates from the unpaired 4d electrons between the nearest-neighbor Mo atoms. These results show that the vacancies can engineer the electronic structure and magnetic properties of monolayer MoSe2, which makes it become novel candidates for photo-catalysis, photoluminescence and spintronic devices. (C) 2018 Elsevier B.V. All rights reserved.
机译:空位和反位缺陷的影响,如V-Mo系,V(MO2)远,V-MO2关闭,V-SE,V-SE2关闭,V-MoSe3,V-MoSe6和Mo-SE2上的电子结构和单层MoSe2的磁特性使用密度函数理论计算进行了系统的研究。理论结果表明,单沫空位(V-Mo系)诱导的3.939亩(测试版),并显示磁halfmetallicity大磁矩由于围绕沫空缺Se的不饱和悬空键。有效的n型掺杂可通过创建硒空缺(V-Se和V-SE2)来实现。然而,硒空位掺杂系统是围绕硒空缺沫钼金属键,这导致的不饱和的Mo悬空键消失形成非磁性所致。的V-MoSe3和V-MoSe6复合缺陷以及钼SE2反位缺陷有缺陷高形成能。的V-MoSe3保持磁性的。然而,V-MoSe6和Mo-SE2缺陷诱导的分别5.74亩(测试版)和1.92亩(测试版),磁矩,其从最近相邻沫原子之间的不成对电子4D起源。这些结果表明,该空缺可以设计电子结构和单层MoSe2,这使得它成为用于光催化,光致发光和自旋电子器件新颖候选的磁特性。 (c)2018年elestvier b.v.保留所有权利。

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