首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Characterization of MFe2O4 (M = Mg, Zn) Thin Films Prepared by Pulsed Laser Deposition for Photoelectrochennical Applications
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Characterization of MFe2O4 (M = Mg, Zn) Thin Films Prepared by Pulsed Laser Deposition for Photoelectrochennical Applications

机译:通过脉冲激光沉积用于光电硬化应用的MFE2O4(M = Mg,Zn)薄膜的表征

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摘要

Earth-abundant visible light-absorbing photoelectrodes of the spinel ferrites ZnFe2O4 and MgFe2O4 have been prepared as dense and crack free thin films using pulsed laser deposition, to investigate the basic electronic properties of these two emerging absorber materials. X-ray diffraction and Raman spectroscopy confirm the phase purity of the prepared thin films, whereas magnetotransport and Hall measurements in combination with Mott-Schottky and photoelectrochemical measurements were performed to reveal the performance-limiting factors of those absorbers for photoelectrochemical water oxidation. Our results provide new insights to improve the performance of ferrite-based photoelectrodes in the future.
机译:使用脉冲激光沉积的尖晶石铁氧体ZnFe2O4和MgFe2O4的尖晶石铁氧体ZnFe2O4和MgFe2O4的地球富有可见光吸光电电极,以研究这两个新兴吸收材料的基本电子性质。 X射线衍射和拉曼光谱证实制备薄膜的相纯度,而磁通量和霍尔测量与Mott-Schottky和光电化学测量相结合,以揭示光电化学水氧化的吸收剂的性能限制因子。 我们的结果提供了新的见解,以提高未来铁氧体的光电系列的性能。

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