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Influence of ingot rocking on the surface quality of multi-wire sawing monocrystalline silicon wafers

机译:铸锭摇摆对多线锯单晶硅晶片表面质量的影响

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This paper aims on slicing of monocrystalline silicon wafers using a newly developed diamond multi-wire reciprocating saw under ingot rocking process. A contact wire length model based on ingot rocking was established. The influence of motion parameters of ingot rocking on the surface quality of multi-wire sawn monocrystalline silicon wafers had been experimentally studied. The slicing surface morphology, surface roughness, and surface hardened layer were investigated by using scanning electron microscope, laser scanning microscopy, and microhardness tester. Results show that compared with the multi-wire cutting mode with an ingot rocking amplitude of 0 degrees, ingot rocking (theta(m) not equal 0) can reduce the contact wire length of sawing by almost half at any time, and realize discontinuous and segmented sawing of large-diameter silicon wafers. By reducing the contact wire length, the cutting mode under ingot rocking can achieve better surface morphologies, and reduce roughness, thickness of the hardened layer and microhardness of the surface in silicon wafer cutting. Compared with the mode of multi-wire reciprocating sawing with an ingot rocking amplitude of 0 degrees, an ingot rocking amplitude of 5 degrees can reduce roughness, thickness of the hardened layer, and microhardness of the surface in silicon wafer cutting about 30.1%, 20.1%, and 11.3%. Though the ingot rocking amplitude did not significantly influence the contact wire length during the cutting process, the ingot rocking motion significantly influences the ingot feed speed, an ingot rocking amplitude of 5 degrees instead of 3 degrees or 7 degrees is suggested for the best surface quality.
机译:使用下锭摇摆过程中新开发的钻石多线往复锯,单晶硅片的切片本文的目的。基于锭摇动成立的接触线长度模型。的锭摆动上多导线锯的单晶硅晶片的表面质量的运动参数的影响已被实验研究。切片表面形态,表面粗糙度,和表面硬化层,通过使用扫描型电子显微镜,激光扫描显微镜和显微硬度计的影响。结果表明,与所述多线切割模式与锭摇摆0度振幅,锭摇摆(希塔(M)不等于0)相比,可减少在任何时候通过几乎一半锯切的接触导线的长度,并实现不连续的并且分割大直径硅晶片的锯切。通过减少接触导线的长度,下锭切割模式摆动可以达到更好的表面形态,并减少粗糙度,在硅晶片切割表面的硬化层和显微硬度的厚度。用多线的模式相比往复具有0度的锭摇摆振幅锯切,5度的锭摇摆幅度可以在硅晶片切割减少粗糙度,硬化层的厚度,并且该表面的显微硬度约30.1%,20.1 %,和11.3%。虽然锭摇摆振幅没有显著在切割过程中影响接触导线的长度,该锭摇摆运动显著影响锭馈送速度,5度而不是3度或7度的锭摆动振幅建议为最佳的表面质量。

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