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Method of measuring carbon concentration of a silicon sample, method of manufacturing a silicon single crystal ingot, silicon monocrystalline ingot and silicon wafer
Method of measuring carbon concentration of a silicon sample, method of manufacturing a silicon single crystal ingot, silicon monocrystalline ingot and silicon wafer
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机译:测量硅样品的碳浓度的方法,制造硅单晶锭的方法,硅单晶锭和硅晶片
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摘要
A method of introducing a hydrogen atom into a silicon sample to be measured and a method of imparting to the evaluation by an evaluation method of evaluating a trap level in the bandgap of silicon without conducting the electron beam irradiation treatment of the silicon sample to be measured in which the hydrogen atom is introduced , Based on an evaluation result of at least one trap level selected from the group consisting of Ec-0.10 eV, Ec-0.13 eV and Ec-0.15 eV among the evaluation results obtained by the evaluation, And determining the carbon concentration, wherein the obtained carbon concentration is less than 1.0E + 16 atoms / cm 3 .
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机译:在不对被测硅样品进行电子束照射处理的情况下,将氢原子引入待测硅样品中的方法和通过评价硅的带隙中的陷阱能级的评价方法来进行评价的方法在其中引入氢原子的基础上,基于通过评估获得的评估结果中选自Ec-0.10 eV,Ec-0.13 eV和Ec-0.15 eV的至少一种陷阱能级的评估结果,确定碳浓度,其中所获得的碳浓度小于1.0E + 16原子/ cm 3。
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